RCA clean
Silicon wafer cleaning procedure in semiconductor manufacturing / From Wikipedia, the free encyclopedia
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The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing.
Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.[1][2][3] It involves the following chemical processes performed in sequence:
- Removal of the organic contaminants (organic clean + particle clean)
- Removal of thin oxide layer (oxide strip, optional)
- Removal of ionic contamination (ionic clean)